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With the expansion of Dow Corning silicone rubber, bilayer photoresist will benefit more semiconductor manufacturers. Jeff Bray mother (Jeff Bremmer) Dow Corning silicon lithography program manager for the global market, while expansion, Dow Corning also plans to accelerate the popularization and application of silicon-based materials in lithography technology.
Photoresist is a kind of photosensitive material. When it receives a certain wavelength of light or radiation, photochemical reaction occurs and it can be selectively removed in the subsequent etching process. Dow Corning's combination of silicone and light-sensitive materials will provide chip makers with a thinner photoresist layer.
Since 2004, Dow Corning has been working with photolithography material suppliers to develop silicone-based photoresists. In December 2006, Dow Corning and a Japanese company jointly developed a bilayer photoresist. The photoresist uses Dow Corning's special silicone resin in the imaging layer, which can provide chip manufacturers with 193 nm photolithography process to provide more excellent etching selectivity. The two companies revealed in December last year that the bilayer photoresist has been provided to a global leading memory chip manufacturer.
In order to meet increasing market demand, Dow Corning Corporation’s electronics division announced in Michigan on February 19 that it plans to more than double its silicone production capacity. This resin is used to fabricate novel bilayer resists in semiconductor lithography processes.
May 28, 2025